Fingerprint
Dive into the research topics of 'Charge trapping by oxygen-related defects in HfO<sub>2</sub>-based High-k gate dielectrics'. Together they form a unique fingerprint.- Sort by
- Weight
- Alphabetically
Charge trapping by oxygen-related defects in HfO2-based High-k gate dielectrics
K. Yamabe, M. Goto, K. Higuchi, A. Uedono, K. Shiraishi, S. Miyazaki, K. Torii, M. Boero, T. Chikyow, S. Yamasaki, H. Kitajimai, K. Yamada, T. Arikado
Research output: Chapter in Book/Report/Conference proceeding › Conference contribution
4
Citations
(Scopus)