Characterization of small areas of thin-films by grazing-exit electron probe X-ray microanalysis

Kouichi Tsuji, Zoya Spolnik, Kazuaki Wagatsuma, Kesami Saito, Katsuhiko Asami

Research output: Contribution to journalArticlepeer-review

1 Citation (Scopus)

Abstract

Metallic thin films deposited on Si wafers were analyzed by EPMA under grazing-exit geometry. The experimental setup consisted of the conventional SEM and EDX. The exit angle was controlled by moving the EDX up and down. After the SEM observation, the electron beam fixed on the analyzed position. And then, the intensities of characteristic X-rays were measured as a function of exit angle. These angle dependences were analyzed by curve fitting of the simulated curves. As a result, the thickness and the density of thin films were evaluated. The difference of the density of chromium thin films prepared by different methods was found. The GE-EPMA measurement was performed for Au-Ag layers on the Si wafer. The thin-film characterization for each layer was independently performed at localized region on Ag and Au layers.

Original languageEnglish
Pages (from-to)414-416
Number of pages3
JournalMaterials Transactions
Volume43
Issue number3
DOIs
Publication statusPublished - 2002 Mar

Keywords

  • Electron probe microanalysis
  • Gold film
  • Silicon wafer
  • Thin film analysis

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

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