Characterization of P+ implanted SiO2 powders

Kenji Kajiyama, Yasuo Suzuki, Tadashi Kokubo, Masakazu Kawashita, Fumiaki Miyaji

Research output: Contribution to conferencePaperpeer-review

4 Citations (Scopus)

Abstract

31P ions were implanted into high-purity SiO2 sphere powders of 20 to approximately 30 μmφ at 50 keV energy with 1.5×1017/cm2 dose utilizing a modified medium-current implanter and, for reference, into SiO2 plate at 200 keV with 1.0×1018/cm2 utilizing a conventional medium-current implanter. P doping profile was measured by 3D-SIMS with 0.5 μmφ Cs+ primary beam. Buried high P-concentration region was revealed. Implanted structure was observed by XTEM, EPMA and μ-RHEED: tens-nm-diameter sphere-like balls of phospho-silicate glass were distributed around the projected range. The top surface was almost unchanged from the substrate and was so thick as to prevent P elusion into hot water.

Original languageEnglish
Pages816-819
Number of pages4
Publication statusPublished - 1996 Dec 1
EventProceedings of the 1996 11th International Conference on Ion Implantation Technology - Austin, TX, USA
Duration: 1996 Jun 161996 Jun 21

Other

OtherProceedings of the 1996 11th International Conference on Ion Implantation Technology
CityAustin, TX, USA
Period96/6/1696/6/21

ASJC Scopus subject areas

  • Engineering(all)

Fingerprint Dive into the research topics of 'Characterization of P<sup>+</sup> implanted SiO<sub>2</sub> powders'. Together they form a unique fingerprint.

Cite this