Characterization of low-temperature microwave plasma treatment with and without UV light for disinfection

Tetsuji Shimizu; Tetyana Nosenko; Gregor Eugen Morfill; Takehiko Sato; Hans Ulrich Schmidt; Takuya Urayama

doi:10.1002/ppap.200900085

Characterization of low-temperature microwave plasma treatment with and without UV light for disinfection

Tetsuji Shimizu, Tetyana Nosenko, Gregor Eugen Morfill, Takehiko Sato, Hans Ulrich Schmidt, Takuya Urayama

Nanoscale Flow Research Division

Research output: Contribution to journal › Article › peer-review

28 Citations (Scopus)

Abstract

Chemical characteristics and bactericidal properties of two low-temperature atmospheric-pressure Ar plasma devices are investigated: one of them with UV and the other with almost no UV on treated samples. The control of the UV radiation is achieved by two nozzles. One has a straight shape, and the other has a 90°-bent. The bent nozzle blocks the light produced inside the torch, whilst allowing the plasma gas to reach the samples. The use of the straight nozzle allows the treatment by both the plasma gas and UV. We demonstrate that even an almost UV-free plasma treatment has bactericidal properties. Our measurements suggest that reactive species represent the main bactericidal factor of our low-temperature plasma.

Original language	English
Pages (from-to)	288-293
Number of pages	6
Journal	Plasma Processes and Polymers
Volume	7
Issue number	3-4
DOIs	https://doi.org/10.1002/ppap.200900085
Publication status	Published - 2010 Mar 22

Keywords

Disinfection
Low-temperature atmospheric plasmas
Microwave discharges
Plasma treatment
Uv light

ASJC Scopus subject areas

Condensed Matter Physics
Polymers and Plastics

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abstract = "Chemical characteristics and bactericidal properties of two low-temperature atmospheric-pressure Ar plasma devices are investigated: one of them with UV and the other with almost no UV on treated samples. The control of the UV radiation is achieved by two nozzles. One has a straight shape, and the other has a 90°-bent. The bent nozzle blocks the light produced inside the torch, whilst allowing the plasma gas to reach the samples. The use of the straight nozzle allows the treatment by both the plasma gas and UV. We demonstrate that even an almost UV-free plasma treatment has bactericidal properties. Our measurements suggest that reactive species represent the main bactericidal factor of our low-temperature plasma.",

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AU - Shimizu, Tetsuji

AU - Nosenko, Tetyana

AU - Morfill, Gregor Eugen

AU - Sato, Takehiko

AU - Schmidt, Hans Ulrich

AU - Urayama, Takuya

PY - 2010/3/22

Y1 - 2010/3/22

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AB - Chemical characteristics and bactericidal properties of two low-temperature atmospheric-pressure Ar plasma devices are investigated: one of them with UV and the other with almost no UV on treated samples. The control of the UV radiation is achieved by two nozzles. One has a straight shape, and the other has a 90°-bent. The bent nozzle blocks the light produced inside the torch, whilst allowing the plasma gas to reach the samples. The use of the straight nozzle allows the treatment by both the plasma gas and UV. We demonstrate that even an almost UV-free plasma treatment has bactericidal properties. Our measurements suggest that reactive species represent the main bactericidal factor of our low-temperature plasma.

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Characterization of low-temperature microwave plasma treatment with and without UV light for disinfection

Abstract

Keywords

ASJC Scopus subject areas

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