Characterization of deposited materials formed by focused ion beam-induced chemical vapor deposition using AuSi alloyed metal source

Takuma Yo, Hideaki Tanaka, Kakunen Koreyama, Takahiro Nagata, Yoshiki Sakuma, Kiyomi Nakajima, Toyohiro Chikyow, Junichi Yanagisawa, Akira Sakai

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

Focused ion beam-induced chemical vapor deposition (FIB-CVD) using Au or Si FIBs with phenanthrene gas was performed to obtain Ga-free carbonaceous materials. The characterization of the deposited materials was investigated by atomic force microscopy, Raman scattering spectroscopy, fluorescent X-ray analysis, and Auger electron spectroscopy. The surface of the deposited film using the Au FIBs was found to be very smooth, and the structure of the deposited material was found to be amorphous-like carbon. Although a Ga-free carbonaceous film was formed, it was found that Au or Si atoms were included, instead of Ga, in the deeper region of the deposited materials than the projected range of the ions of such atoms, resulting in the formation of a double-layer structure in the deposited materials, indicating that the events that occurred in FIB-CVD using the Au or Si FIBs were similar to those in the same process using the Ga FIBs. However, it was also found that the behaviour of the incorporated Au atoms in the deposited films by annealing was different from that of the Ga atoms.

Original languageEnglish
Pages (from-to)5018-5021
Number of pages4
JournalJapanese journal of applied physics
Volume47
Issue number6 PART 2
DOIs
Publication statusPublished - 2008 Jun 20
Externally publishedYes

Keywords

  • Chemical vapor deposition
  • Diamond-like carbon
  • FIB-CVD
  • Focused ion beam

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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  • Cite this

    Yo, T., Tanaka, H., Koreyama, K., Nagata, T., Sakuma, Y., Nakajima, K., Chikyow, T., Yanagisawa, J., & Sakai, A. (2008). Characterization of deposited materials formed by focused ion beam-induced chemical vapor deposition using AuSi alloyed metal source. Japanese journal of applied physics, 47(6 PART 2), 5018-5021. https://doi.org/10.1143/JJAP.47.5018