Characterization of a multilayer soft X-ray reflector fabricated by pulsed laser deposition

Dong Eon Kim, Soo Mi Lee, In Joon Jeon, M. Yanagihara

Research output: Contribution to journalArticlepeer-review

10 Citations (Scopus)


A Mo/Si multilayer (ML) has been fabricated as a reflector in the soft X-ray spectral region by pulsed laser deposition (PLD), using the second harmonic of Nd/YAG pulsed laser (5 ns, 532 nm light). The ML structure was characterized by transmission electron microscopy (TEM), small-angle X-ray scattering (SAXS) and photoelectron spectroscopy for chemical analysis (ESCA). The near-normal incidence reflectivity in the spectral range of 14-17 nm was measured using a soft X-ray reflectometer based on a laser-produced plasma. The structural parameters were evaluated by fitting to both the SAXS profile and the soft X-ray reflectance measurement with asymmetric interface profile, roughness and composition taken into account.

Original languageEnglish
Pages (from-to)531-535
Number of pages5
JournalApplied Surface Science
Publication statusPublished - 1998 May
Externally publishedYes


  • Multilayer
  • Pulsed laser deposition
  • Small-angle X-ray scattering
  • Soft X-ray reflectivity

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Physics and Astronomy(all)
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films


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