Characterization for morphology of thin deposited Fe, Fe 2 O 3 and Cr 2 O 3 films on silicon wafer using grazing incidence X-ray scattering

T. Kosaka, Shigeru Suzuki, M. Saito, Y. Waseda, E. Matsubara, K. Sadamori, E. Aoyagi

Research output: Contribution to journalArticlepeer-review

5 Citations (Scopus)

Abstract

Thin Fe, Fe 2 O 3 and Cr 2 O 3 films deposited on Si wafers have been investigated by grazing incidence X-ray scattering (GIXS) and the results have been compared with microstructural data by atomic force microscopy (AFM) and transmission electron microscopy (TEM). It is found that changes in density of these films can be estimated from the critical angle in X-ray reflection curves. Measurements in GIXS with two different geometries indicate the preferential orientation of crystalline Fe and Fe 2 O 3 films. AFM and TEM observation shows characteristic features in microstructures of the films, and it is indicate that a ten nanometer order of magnitude of roughness in the surface prevents the oscillations in the X-ray reflection curves.

Original languageEnglish
Pages (from-to)74-78
Number of pages5
JournalThin Solid Films
Volume289
Issue number1-2
DOIs
Publication statusPublished - 1996 Nov 30

Keywords

  • Iron
  • Iron oxide
  • X-ray scattering
  • X-ray total reflection analysis

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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