Characterization and selective growth of amorphous Y-Ba-Cu-O film

T. Tanigaki, S. Ariumi, H. Suzuki, Yuki Kimura, S. Kimura, T. Sato, N. Tsuda, T. Nakada, Y. Saito, C. Kaito

Research output: Contribution to journalArticle

Abstract

Amorphous Y-Ba-Cu-O films prepared by Ar ion sputtering at room temperature have been studied by high-resolution transmission electron microscopy (HRTEM). As-deposited film was composed of a mixture of microcrystallites of YBa2Cu3Ox, YBa2Cu4Ox, Y2BaCuOx and Y2Ba4Cu7Ox phases with the size of 3-5 nm. The produced film was crystallized above 300°C by heating in air. The selective crystal growth of the above four phases was observed upon heating up to 600°C, which was a lower temperature than the general epitaxial growth temperature of Y-Ba-Cu-O film.

Original languageEnglish
Pages (from-to)77-84
Number of pages8
JournalPhysics of Low-Dimensional Structures
Volume11-12
Publication statusPublished - 2002 Dec 1

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Physics and Astronomy (miscellaneous)

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    Tanigaki, T., Ariumi, S., Suzuki, H., Kimura, Y., Kimura, S., Sato, T., Tsuda, N., Nakada, T., Saito, Y., & Kaito, C. (2002). Characterization and selective growth of amorphous Y-Ba-Cu-O film. Physics of Low-Dimensional Structures, 11-12, 77-84.