Characteristics of RF H- ion source by using FET power source

A. Ando; C. H. Moon; J. Komuro; K. Tsumori; Y. Takeiri

doi:10.1063/1.3112524

Characteristics of RF H^- ion source by using FET power source

A. Ando, C. H. Moon, J. Komuro, K. Tsumori, Y. Takeiri

ENG - Electrical Engineering

Research output: Contribution to journal › Conference article › peer-review

3 Citations (Scopus)

Abstract

Characteristics of radio frequency(rf) plasma production are investigated using a FET inverter power supply as an rf generator. The matching circuit in the inverter system is simple compared to a conventional 50 Ohm matching system and only an imaginary part of the impedance of rf transmission should be matched by adjusting operating frequency or capacitance of the circuit. An electron density over 10¹⁸m^-3 is produced in argon plasma with lkW rf power. Lower densities are obtained in helium and hydrogen plasmas compared to the argon plasma. Effect of axial magnetic field in driver region is examined. Electron density more than 10¹⁸m^-3 is obtained at the hydrogen gas pressure around lPa with the help of the axial magnetic field.

Original language	English
Pages (from-to)	291-296
Number of pages	6
Journal	AIP Conference Proceedings
Volume	1097
DOIs	https://doi.org/10.1063/1.3112524
Publication status	Published - 2009 May 5
Event	1st International Symposium on Negative Ions, Beams and Sources - Aix-en-Provence, France Duration: 2008 Sep 9 → 2008 Sep 12

Keywords

FET inverter
Ion source
Neutral beam injector
rf plasma

ASJC Scopus subject areas

Physics and Astronomy(all)

Access to Document

10.1063/1.3112524

Cite this

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title = "Characteristics of RF H- ion source by using FET power source",

abstract = "Characteristics of radio frequency(rf) plasma production are investigated using a FET inverter power supply as an rf generator. The matching circuit in the inverter system is simple compared to a conventional 50 Ohm matching system and only an imaginary part of the impedance of rf transmission should be matched by adjusting operating frequency or capacitance of the circuit. An electron density over 1018m-3 is produced in argon plasma with lkW rf power. Lower densities are obtained in helium and hydrogen plasmas compared to the argon plasma. Effect of axial magnetic field in driver region is examined. Electron density more than 1018m-3 is obtained at the hydrogen gas pressure around lPa with the help of the axial magnetic field.",

keywords = "FET inverter, Ion source, Neutral beam injector, rf plasma",

author = "A. Ando and Moon, {C. H.} and J. Komuro and K. Tsumori and Y. Takeiri",

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journal = "AIP Conference Proceedings",

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note = "1st International Symposium on Negative Ions, Beams and Sources ; Conference date: 09-09-2008 Through 12-09-2008",

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TY - JOUR

T1 - Characteristics of RF H- ion source by using FET power source

AU - Ando, A.

AU - Moon, C. H.

AU - Komuro, J.

AU - Tsumori, K.

AU - Takeiri, Y.

PY - 2009/5/5

Y1 - 2009/5/5

N2 - Characteristics of radio frequency(rf) plasma production are investigated using a FET inverter power supply as an rf generator. The matching circuit in the inverter system is simple compared to a conventional 50 Ohm matching system and only an imaginary part of the impedance of rf transmission should be matched by adjusting operating frequency or capacitance of the circuit. An electron density over 1018m-3 is produced in argon plasma with lkW rf power. Lower densities are obtained in helium and hydrogen plasmas compared to the argon plasma. Effect of axial magnetic field in driver region is examined. Electron density more than 1018m-3 is obtained at the hydrogen gas pressure around lPa with the help of the axial magnetic field.

AB - Characteristics of radio frequency(rf) plasma production are investigated using a FET inverter power supply as an rf generator. The matching circuit in the inverter system is simple compared to a conventional 50 Ohm matching system and only an imaginary part of the impedance of rf transmission should be matched by adjusting operating frequency or capacitance of the circuit. An electron density over 1018m-3 is produced in argon plasma with lkW rf power. Lower densities are obtained in helium and hydrogen plasmas compared to the argon plasma. Effect of axial magnetic field in driver region is examined. Electron density more than 1018m-3 is obtained at the hydrogen gas pressure around lPa with the help of the axial magnetic field.

KW - FET inverter

KW - Ion source

KW - Neutral beam injector

KW - rf plasma

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