Characteristics of RF H- ion source by using FET power source

A. Ando, C. H. Moon, J. Komuro, K. Tsumori, Y. Takeiri

Research output: Contribution to journalConference article

3 Citations (Scopus)

Abstract

Characteristics of radio frequency(rf) plasma production are investigated using a FET inverter power supply as an rf generator. The matching circuit in the inverter system is simple compared to a conventional 50 Ohm matching system and only an imaginary part of the impedance of rf transmission should be matched by adjusting operating frequency or capacitance of the circuit. An electron density over 1018m-3 is produced in argon plasma with lkW rf power. Lower densities are obtained in helium and hydrogen plasmas compared to the argon plasma. Effect of axial magnetic field in driver region is examined. Electron density more than 1018m-3 is obtained at the hydrogen gas pressure around lPa with the help of the axial magnetic field.

Original languageEnglish
Pages (from-to)291-296
Number of pages6
JournalAIP Conference Proceedings
Volume1097
DOIs
Publication statusPublished - 2009 May 5
Event1st International Symposium on Negative Ions, Beams and Sources - Aix-en-Provence, France
Duration: 2008 Sep 92008 Sep 12

Keywords

  • FET inverter
  • Ion source
  • Neutral beam injector
  • rf plasma

ASJC Scopus subject areas

  • Physics and Astronomy(all)

Fingerprint Dive into the research topics of 'Characteristics of RF H<sup>-</sup> ion source by using FET power source'. Together they form a unique fingerprint.

  • Cite this