Characteristics of carbon-related materials deposited in electron-energy controlled CH4/H2 RF discharge plasmas

Junichi Emi, Satoru Iizuka

Research output: Contribution to journalArticlepeer-review

3 Citations (Scopus)

Abstract

The influence of electron temperature Te on the production of carbon-related materials was investigated in a hollow-type magnetron radio-frequency (RF) CH4/H2 plasma. Here, the electron temperature decreased along the plasma column. Since the dissociation of CH 4 is determined by the electron energy in plasmas, the density ratio of radicals CH2/CH3 can be varied by the electron temperature. Therefore, the change of the electron temperature is quite important for controlling the characteristics of carbon-related materials. In the experiment, the production of diamond microparticles in low Te plasma was detected. On the other hand, thin carbon films consisting of graphitic carbons were observed in the high Te plasma. Therefore, it is shown that control of the electron temperature in the plasma has a key effect on the film quality.

Original languageEnglish
Pages (from-to)568-572
Number of pages5
JournalDiamond and Related Materials
Volume20
Issue number4
DOIs
Publication statusPublished - 2011 Apr

Keywords

  • Amorphous graphite
  • Diamond microparticle
  • Diamond-like carbon
  • Diamond-like carbons
  • Electron temperature control
  • Plasma CVD

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Chemistry(all)
  • Mechanical Engineering
  • Physics and Astronomy(all)
  • Materials Chemistry
  • Electrical and Electronic Engineering

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