Characteristic of LiTaO3 film growth by chemical vapor deposition

Michio Kadota, Hikari Tochishita

Research output: Contribution to journalArticlepeer-review

1 Citation (Scopus)

Abstract

LiTaO3 is a key material for surface acoustic wave (SAW) devices, bulk devises, piezoelectric elements, pyroelectric sensors and other applications. However, for almost of their applications the LiTaO3 single crystal is used. In this paper, authors report the growth of LiTaO 3 films on a metal electrode layer by Chemical Vapor Deposition (CVD) by changing Li source condition. The characteristics of the LiTaO3 films observed by the X-ray diffraction (XRD) and their polarity dependent on the Li source supply volume. By controlling the Li/Ta ratio, high quality ferroelectric LiTaO3 films are deposited.

Original languageEnglish
Pages (from-to)1188-1189
Number of pages2
JournalIEEJ Transactions on Electronics, Information and Systems
Volume131
Issue number6
DOIs
Publication statusPublished - 2011

Keywords

  • CVD

ASJC Scopus subject areas

  • Electrical and Electronic Engineering

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