Changes in chemical bonding of diamond-like carbon films by atomic-hydrogen exposure

H. Nakazawa, R. Osozawa, Y. Enta, M. Suemitsu

Research output: Contribution to journalArticlepeer-review

5 Citations (Scopus)


We have deposited unhydrogenated diamond-like carbon (DLC) films on Si substrate by pulsed laser deposition using KrF excimer laser, and investigated the effects of atomic-hydrogen exposure on the structure and chemical bonding of the DLC films by photoelectron spectroscopy (PES) using synchrotron radiation and Raman spectroscopy. The fraction of sp3 bonds at the film surface, as evaluated from C1s spectra, increased at a substrate temperature of 400 °C by atomic-hydrogen exposure, whereas the sp3 fraction decreased at 700 °C with increasing exposure time. It was found that the sp3 fraction was higher at the surfaces than the subsurfaces of the films exposed to atomic hydrogen at both the temperatures. The Raman spectrum of the film exposed to atomic hydrogen at 400 °C showed that the clustering of sp2 carbon atoms progressed inside the film near the surface even at such a low temperature as 400 °C.

Original languageEnglish
Pages (from-to)1387-1392
Number of pages6
JournalDiamond and Related Materials
Issue number11
Publication statusPublished - 2010 Nov


  • Diamond-like carbon
  • Hydrogen
  • Photoelectron spectroscopy
  • Pulsed laser deposition

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Chemistry(all)
  • Mechanical Engineering
  • Materials Chemistry
  • Electrical and Electronic Engineering


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