CF and CF2 radical densities in 13.56-Mhz CHF3/Ar inductively coupled plasma

Hideo Nakagawa, Mitsuru Okigawa, Satoshi Morishita, Syuichi Noda, Hisataka Hayashi, Katsuyuki Ito, Masami Inoue, Makoto Sekine

Research output: Contribution to journalArticle

9 Citations (Scopus)

Abstract

Radial and axial distributions of CF and CF2 radical densities in CHF3/Ar inductively coupled plasma (ICP) generated by a radio frequency of 13.56MHz were evaluated using laser-induced fluorescence (LIF). The radical densities in the bulk plasma were estimated by combining the density distributions measured by LIF with the absolute radical density measured by appearance mass spectrometry (AMS) near the reactor wall. Axial and radial distributions of CF and CF2 radical densities were extremely hollow. The radial distribution was strongly correlated with the electron density distribution and was significantly influenced by the dissociation process resulting from the electron excitation in the reactor space. The axial distribution, on the other hand, was mainly determined by the surface reaction of radicals on the wafer.

Original languageEnglish
Pages (from-to)319-325
Number of pages7
JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume41
Issue number1
DOIs
Publication statusPublished - 2002 Jan 1

Keywords

  • AMS
  • Actinometry
  • CF
  • Electron density
  • Electron temperature
  • F
  • ICP
  • LIF
  • OES
  • Probe
  • Wall interaction

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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