Carrier properties of B atomic-layer-doped Si films grown by ECR Ar plasma-enhanced CVD without substrate heating

Masao Sakuraba, Katsutoshi Sugawara, Takayuki Nosaka, Hisanao Akima, Shigeo Sato

Research output: Contribution to journalArticlepeer-review

4 Citations (Scopus)

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Chemical Compounds

Engineering & Materials Science