Carbon sputtering of a thin carbon film, a pure graphite sample and a part of an exposed limiter sample from JET

H. Bergsåker, S. Nagata, B. Emmoth

Research output: Contribution to journalArticlepeer-review

3 Citations (Scopus)

Abstract

Carbon ions were accelerated to energies in the range 1 to 14 keV, and were used to bombard three different carbon samples (two bulk graphite targets and one evaporated thin carbon film) in order to compare the carbon self-sputtering yields. Sputtered particles were collected on a surface situated in the backward direction. A second, high energy beam was used in quantitative analysis of collected carbon, which could be performed without breaking or changing the vacuum conditions. In thin carbon film case, the change of the film thickness was also monitored. The residual gas composition was continuously studied with a quadrupole mass spectrometer.

Original languageEnglish
Pages (from-to)364-367
Number of pages4
JournalJournal of Nuclear Materials
Volume145-147
Issue numberC
DOIs
Publication statusPublished - 1987 Feb 2

Keywords

  • carbon
  • collector method
  • selfsputtering

ASJC Scopus subject areas

  • Nuclear and High Energy Physics
  • Materials Science(all)
  • Nuclear Energy and Engineering

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