Buried interfaces of heat-loaded Mo/Si multilayers studied by soft-x-ray emission spectroscopy

N. Miyata, T. Imazono, S. Ishikawa, A. Arai, M. Yanagihara, M. Watanabe

Research output: Contribution to journalArticlepeer-review

2 Citations (Scopus)

Abstract

We measured Si L2,3 soft-x-ray emission spectra from Mo/Si multilayers annealed at 400°C. We showed that MoSi2 was formed at the interface, and the thickness of the MoSi2 interlayer increased with the annealing time. By an analysis of the soft-x-ray emission spectra and the patterns of small-angle x-ray diffraction, we estimated the thickness of the MoSi2 interlayer and a diffusion coefficient between Mo and Si at 400°C as 1.1 (±0.2) × 10-18 cm2/s. We showed that soft-x-ray emission spectroscopy is a useful tool for studying the thermal change of the buried interface nondestructively.

Original languageEnglish
Pages (from-to)663-667
Number of pages5
JournalSurface Review and Letters
Volume9
Issue number2
DOIs
Publication statusPublished - 2002 Apr

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

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