Broadening the applications of the atom probe technique by ultraviolet femtosecond laser

K. Hono, T. Ohkubo, Y. M. Chen, M. Kodzuka, K. Oh-ishi, H. Sepehri-Amin, F. Lia, T. Kinno, S. Tomiya, Y. Kanitani

Research output: Contribution to journalArticlepeer-review

75 Citations (Scopus)

Abstract

Laser assisted field evaporation using ultraviolet (UV) wavelength gives rise to better mass resolution and signal-to-noise ratio in atom probe mass spectra of metals, semiconductors and insulators compared to infrared and green lasers. Combined with the site specific specimen preparation techniques using the lift-out and annular Ga ion milling in a focused ion beam machine, a wide variety of materials including insulating oxides can be quantitatively analyzed by the three-dimensional atom probe using UV laser assisted field evaporation. After discussing laser irradiation conditions for optimized atom probe analyses, recent atom probe tomography results on oxides, semiconductor devices and grain boundaries of sintered magnets are presented.

Original languageEnglish
Pages (from-to)576-583
Number of pages8
JournalUltramicroscopy
Volume111
Issue number6
DOIs
Publication statusPublished - 2011
Externally publishedYes

Keywords

  • Atom probe
  • Atom probe tomography
  • Field evaporation
  • Laser atom probe

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Instrumentation

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