Broadband antireflection gratings fabricated upon silicon substrates

Y. Kanamori, M. Sasaki, K. Hane

Research output: Contribution to journalArticlepeer-review

405 Citations (Scopus)

Abstract

We fabricated a two-dimensional subwavelength structured (SWS) surface upon a crystal silicon substrate. The SWS surface was patterned by electron beam lithography and etched by an SF6 fast atom beam. The SWS grating had a conical profile, the period was 150 nm, and the groove was approximately 350 nm deep. The reflectivity was examined at 200-2500-nm wavelengths. At 400 nm the reflectivity decreased to 0.5% from the 54.7% of the silicon substrate. We also used He-Ne laser light to examine the reflectivity as a function of the incident angle.

Original languageEnglish
Pages (from-to)1422-1424
Number of pages3
JournalOptics Letters
Volume24
Issue number20
DOIs
Publication statusPublished - 1999 Oct 15

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics

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