Bridging the pressure gap in water and hydroxyl chemistry on metal surfaces: The Cu(110) case

Klas Andersson, Guido Ketteler, Hendrik Bluhm, Susumu Yamamoto, Hirohito Ogasawara, Lars G.M. Pettersson, Miquel Salmeron, Anders Nilsson

Research output: Contribution to journalArticlepeer-review

61 Citations (Scopus)

Abstract

We report the first measurements on the quantitative partitioning of water between its molecular and dissociated forms at a gas-metal interface under elevated water pressures and temperatures. By means of synchrotron-based in situ photoelectron spectroscopy, mixed H 2O and OH phases on Cu(110) at H 2O pressures up to 1 Torr in the 275-520 K temperature range are studied. In increasing order of stability, three phases with H 2O/OH ratios of 2:1, 1:1, and 0:1 were observed. It was found that surprisingly large quantities of molecular water are present on the surface up to 428 K in 1 Torr H 2O. A detailed comparison with previous ultrahigh vacuum (UHV) studies shows that the observed species, phases, and chemical kinetics under UHV compare very well with our results at elevated pressures and temperatures. The stability of the hydrogen-bonded H 2O-OH complex'at the surface, and its influence on the adsorption-desorption and dissociation kinetics, constitutes the essential link between our results and those obtained under UHV conditions.

Original languageEnglish
Pages (from-to)14493-14499
Number of pages7
JournalJournal of Physical Chemistry C
Volume111
Issue number39
DOIs
Publication statusPublished - 2007 Oct 4
Externally publishedYes

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Energy(all)
  • Physical and Theoretical Chemistry
  • Surfaces, Coatings and Films

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