Boundary structure of Mo/Si multilayers for soft X-ray mirrors

Masahiko Ishino, Osamu Yoda, Yasuyuki Haishi, Fumiko Arimoto, Mitsuhiro Takeda, Seiichi Watanabe, Somei Ohnuki, Hiroaki Abe

Research output: Contribution to journalArticle

12 Citations (Scopus)

Abstract

Characterizations of Mo/Si multilayers for soft X-ray mirrors have been carried out by high-resolution transmission electron microscopy (TEM) and X-ray scatterings. The crystallite size of oriented Mo in the direction normal to the (110) plane has been found to be approximately equal to the designed thickness of the Mo layer below 8 nm. However, when the Mo layer thickness becomes greater than 8 nm, the crystallite size deviates from the designed thickness and saturates at about 10 nm. The Si layer thickness is smaller than the expected one, which is calculated from the periodic length and the Mo layer thickness, indicating that the mixed layer at the interface is formed in the Si layer. The thickness and density of the mixed layer at the Mo-on-Si interface are larger than those at the Si-on-Mo interface. The sum of the thicknesses of the mixed layer is about 1.4 nm, irrespective of the Mo/Si composition. Moreover, the density of the mixed layer at the Mo-on-Si interface becomes larger with the increase of the Mo content.

Original languageEnglish
Pages (from-to)3052-3056
Number of pages5
JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume41
Issue number5 A
Publication statusPublished - 2002 May 1

Keywords

  • Mixed layer
  • Mo(110) crystallite size
  • Mo/Si multilayer

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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  • Cite this

    Ishino, M., Yoda, O., Haishi, Y., Arimoto, F., Takeda, M., Watanabe, S., Ohnuki, S., & Abe, H. (2002). Boundary structure of Mo/Si multilayers for soft X-ray mirrors. Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 41(5 A), 3052-3056.