Bottom-up strategy of materials fabrication: A new trend in nanotechnology of soft materials

Masatsugu Shimomura, Tetsuro Sawadaishi

    Research output: Contribution to journalReview article

    286 Citations (Scopus)

    Abstract

    Recent progresses in nanometer-scale molecular self-organization and mesoscopic pattern formation are reviewed from the view point of nanotechnology of bottom-up materials fabrication. Nanometer-scale layer-by-layer self-assemblies on nanoparticles will provide wide applications in many fields. The micro-contact printing technique is effectively used for up-sizing the nanostructured molecular assemblies as submicrometer- and micrometer-scale patterns. Dissipative structures formed in non-equilibrium systems as self-organized spatio-temporal structures are newly employed for the mesoscopic patterning of the nanostructured molecular assemblies.

    Original languageEnglish
    Pages (from-to)11-16
    Number of pages6
    JournalCurrent Opinion in Colloid and Interface Science
    Volume6
    Issue number1
    DOIs
    Publication statusPublished - 2001 Apr 3

    Keywords

    • Dissipative structure
    • Mesoscopic patterning
    • Molecular self-assembly
    • Nano-technology
    • Self-organization

    ASJC Scopus subject areas

    • Surfaces and Interfaces
    • Physical and Theoretical Chemistry
    • Polymers and Plastics
    • Colloid and Surface Chemistry

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