Blocking of deuterium diffusion in poly-Si/Al2O3/HfxSi1-xO2/SiO2 high- k stacks as evidenced by atom probe tomography

Y. Tu, B. Han, Yasuo Shimizu, Y. Kunimune, Y. Shimada, T. Katayama, T. Ide, M. Inoue, F. Yano, K. Inoue, Y. Nagai

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