Blister formation in rutile TiO2(1 0 0) films by helium irradiation

S. Yamamoto, S. Nagata, A. Takayama, M. Yoshikawa

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8 Citations (Scopus)


Incident energy, fluence of helium ion and temperature for blister formation in rutile TiO2(1 0 0) films were investigated. Epitaxial rutile TiO2(1 0 0) films were grown on α-Al2O3(0 0 0 1) substrates by pulsed laser deposition. The films were irradiated at room temperature and 95 K with 4 keV helium ions up to fluence range from 1.0 × 1016 to 2.3 × 1017 ions/cm2. The surface morphology of TiO2 films was observed by scanning electron microscope and atomic force microscope. Rutherford backscattering spectroscopy with channeling was used to determine the depth profile of radiation-induced damage. In the case of room temperature irradiation with fluences higher than 2 × 1016 ions/cm2, helium blisters with 100-200 nm sizes in TiO2 films were observed. Furthermore, helium irradiation at 95 K resulted in smaller size blisters (∼50 nm). It is suggested that the size of blisters in TiO2(1 0 0) films is strongly affected by the temperature during the helium irradiation. The photo-induced superhydrophilicity of TiO2 films was improved by high fluence helium irradiation, which caused blister growth.

Original languageEnglish
Pages (from-to)374-376
Number of pages3
JournalNuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
Issue number1-2 SPEC. ISS.
Publication statusPublished - 2006 Aug


  • Blister
  • Helium
  • Titanium compounds

ASJC Scopus subject areas

  • Nuclear and High Energy Physics
  • Instrumentation


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