TY - JOUR
T1 - Bias-current modulation technique of a radio-frequency glow discharge plasma for atomic emission analysis associated with a fast Fourier transform analyzer
AU - Wagatsuma, Kazuaki
AU - Urushibata, Satomi
N1 - Funding Information:
A part of this research is supported by a Grant-in-Aid from the Ministry of Education, Science, Sports and Culture of Japan (No. 18360016 ).
PY - 2010/5
Y1 - 2010/5
N2 - A measuring method using a fast Fourier transform (FFT) analyzer is suggested to estimate the emission intensity from a radio-frequency (RF)-powered glow discharge plasma for atomic emission analysis. The FFT analyzer has an ability to disperse the components by frequency from an overall signal, and thus works as a selective detector in modulation spectroscopy. In the RF glow discharge plasma, a dc bias current can be introduced by connecting an external electric circuit with the discharge lamp, which predominantly enhances the emission intensities. Further, the bias current can be pulsated with a switching device to modulate the emission intensities, and then the modulated component was selectively detected with the FFT analyzer. This method greatly improved the data precision. The emission intensity of the Cu I 324.75-nm line in an Fe-based alloy sample containing 0.043 mass% Cu could be estimated with a relative standard deviation of 0.20%. The 3σ detection limits of Cu in Fe-based alloys could be obtained to be 2.3 × 10- 6 mass% Cu for Cu I 324.75 nm and 6.8 × 10- 6 mass% Cu for Cu I 327.40 nm.
AB - A measuring method using a fast Fourier transform (FFT) analyzer is suggested to estimate the emission intensity from a radio-frequency (RF)-powered glow discharge plasma for atomic emission analysis. The FFT analyzer has an ability to disperse the components by frequency from an overall signal, and thus works as a selective detector in modulation spectroscopy. In the RF glow discharge plasma, a dc bias current can be introduced by connecting an external electric circuit with the discharge lamp, which predominantly enhances the emission intensities. Further, the bias current can be pulsated with a switching device to modulate the emission intensities, and then the modulated component was selectively detected with the FFT analyzer. This method greatly improved the data precision. The emission intensity of the Cu I 324.75-nm line in an Fe-based alloy sample containing 0.043 mass% Cu could be estimated with a relative standard deviation of 0.20%. The 3σ detection limits of Cu in Fe-based alloys could be obtained to be 2.3 × 10- 6 mass% Cu for Cu I 324.75 nm and 6.8 × 10- 6 mass% Cu for Cu I 327.40 nm.
KW - Bias-current modulation
KW - Copper
KW - Fast Fourier transform analyzer
KW - Glow discharge plasma
KW - Iron-based alloy
KW - Optical emission spectrometry
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U2 - 10.1016/j.microc.2009.11.007
DO - 10.1016/j.microc.2009.11.007
M3 - Article
AN - SCOPUS:76849085823
VL - 95
SP - 107
EP - 112
JO - Microchemical Journal
JF - Microchemical Journal
SN - 0026-265X
IS - 1
ER -