Ba2NaNb5O15 thin film formed by electron cyclotron resonance plasma sputtering

A. Watazu, H. Masumoto

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1 Citation (Scopus)

Abstract

Ba2NaNb5O15 (BNN) thin films were formed on sapphire (0001) substrates and magnesium oxide substrates using electron cyclotron resonance plasma sputtering. The BNN films were 7.2-8.4 μm thick and had atomic ratio compositions of Ba=2.0-2.1/5Nb and Na=0.9-1.1/5Nb. The films had no cracks. Single-phase BNN and (001)-oriented BNN films on sapphire (0001) were obtained at 823 K and 923 K. An in-plane-oriented BNN film on sapphire (0001) was formed at 923 K. The films were transparent and had the ability of second harmonic generation. The films on magnesium oxide (100) were also single-phase BNN, and (001)-oriented BNN films were obtained at 823 K, 873 K, and 923 K. An in-plane-oriented BNN film on magnesium oxide (100) was formed at 823 K. The films were transparent.

Original languageEnglish
Article number012066
JournalJournal of Physics: Conference Series
Volume417
Issue number1
DOIs
Publication statusPublished - 2013
Event15th International Conference on Thin Films, ICTF 2011 - Kyoto, Japan
Duration: 2011 Nov 82011 Nov 11

ASJC Scopus subject areas

  • Physics and Astronomy(all)

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