Abstract
The authors have investigated the thickness-dependent physical properties of PrNiO3 ultrathin films epitaxially grown on LaAlO3 substrates. The strained PrNiO3 films exhibit metallic behavior and do not show any indication of temperature-driven metal-insulator transition (MIT) in bulk form, whereas an insulating ground state is realized in a thin limit. In situ photoemission measurements reveal that the observed thickness-dependent MIT is caused by the reduction in bandwidth due to the dimensional control of the films. These results strongly suggest that the MIT in PrNiO3 films can be controlled by changing the dimensionality under epitaxial constraint.
Original language | English |
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Article number | 171609 |
Journal | Applied Physics Letters |
Volume | 104 |
Issue number | 17 |
DOIs | |
Publication status | Published - 2014 Apr 28 |
Externally published | Yes |
ASJC Scopus subject areas
- Physics and Astronomy (miscellaneous)