Atomically Controlled Processing for Future Si-Based Devices

Junichi Murota, Masao Sakuraba, Bernd Tillack

Research output: Chapter in Book/Report/Conference proceedingChapter

Original languageEnglish
Title of host publicationFuture Trends in Microelectronics
Subtitle of host publicationUp the Nano Creek
PublisherJohn Wiley & Sons, Inc.
Pages246-258
Number of pages13
ISBN (Print)9780470081464
DOIs
Publication statusPublished - 2007 Jan 22

Keywords

  • Automatically controlled processing
  • CVD processing
  • Chemical vapor deposition
  • Depth dependence
  • Low temperature processing

ASJC Scopus subject areas

  • Engineering(all)

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