Atomically controlled Ge epitaxial growth on Si(1 0 0) in Ar-plasma-enhanced GeH4 reaction

Katsutoshi Sugawara, Masao Sakuraba, Junichi Murota

Research output: Contribution to journalArticlepeer-review

14 Citations (Scopus)

Abstract

Ar-plasma-enhanced GeH4 reaction using an ultraclean electron cyclotron resonance (ECR) plasma apparatus is investigated, and atomically flat Ge epitaxial growth on Si(1 0 0) is achieved even without substrate heating. It is found that the crystallinity degradation of deposited Ge film is caused by incorporation of Ar into the film under Ar plasma irradiation. The Ar incorporation could be suppressed by lowering substrate surface temperature as well as incident Ar ion energy. The Ge film has large compressive in-plane strain and relaxes by heat treatment at 600 °C. These results open the way to atomically controlled Ge epitaxial growth at very low temperature.

Original languageEnglish
Pages (from-to)69-72
Number of pages4
JournalMaterials Science in Semiconductor Processing
Volume8
Issue number1-3 SPEC. ISS.
DOIs
Publication statusPublished - 2005 Feb 1

Keywords

  • Electron cyclotron resonance
  • Ge epitaxial growth
  • GeH
  • Plasma-enhanced chemical vapor deposition
  • Si(1 0 0)

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

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