Atomically controlled formation of strained Si1-xGe x/Si quantum heterostructure for room-temperature resonant tunneling diode

Masao Sakuraba, Junichi Murota

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Atomically controlled formation of strained Si1-xGe x/Si quantum heterostructure was investigated in order to improve negative differential conductance (NDC) characteristics of high-Ge-fraction strained Si1-xGex/Si hole resonant tunneling diode with nanometer-order thick strained Si1-xGex and unstrained Si layers. Recently, especially to suppress the roughness generation at heterointerfaces for higher Ge fraction, Si barriers were deposited using Si2H6 reaction at a lower temperature of 400 °C instead of SiH4 reaction at 500 °C after the Si0.42Ge0.58 growth. NDC characteristics show that difference between peak and valley currents is effectively enhanced at 11-295 K by using Si2H6 at 400 °C, compared with that using SiH4 at 500 °C. Thermionic-emission dominant characteristics suggests a possibility that introduction of larger barrier height enhances the NDC at room temperature by suppression of thermionic-emission current. In this paper, based on our results, advanced epitaxial growth process of RTDs with atomically controlled Si/strained Si 1-xGex heterostructures on Si(100) are reviewed.

Original languageEnglish
Title of host publicationULSI Process Integration 7
PublisherElectrochemical Society Inc.
Pages309-314
Number of pages6
Edition7
ISBN (Electronic)9781607682615
ISBN (Print)9781566779074
DOIs
Publication statusPublished - 2011
Externally publishedYes
Event7th Symposium on ULSI Process Integration - 220th ECS Meeting - Boston, MA, United States
Duration: 2011 Oct 92011 Oct 14

Publication series

NameECS Transactions
Number7
Volume41
ISSN (Print)1938-5862
ISSN (Electronic)1938-6737

Other

Other7th Symposium on ULSI Process Integration - 220th ECS Meeting
Country/TerritoryUnited States
CityBoston, MA
Period11/10/911/10/14

ASJC Scopus subject areas

  • Engineering(all)

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