Atomic-scale structure of CVO amorphous Si3N4-BN composite

Toshiharu Fukunaga, Takashi Goto, Masakatsu Misawa, Toshio Hirai, Kenji Suzuki

Research output: Contribution to journalArticlepeer-review

14 Citations (Scopus)

Abstract

The atomic structure of amorphous Si3N4-BN composite prepared by CVD has been investigate by neutron total scattering. The small angle scattering intensity observed previously in S(Q) of amorphous Si3N4 has not been observed in case of amorphous Si3N4-BN composite. This may show that the voids of about 10 A in diameter, contained in amorphous Si3N4, are occupied by turbostratic BN in amorphous Si3N4-BN composite. This turbostratic BN can be presumed to be built of frustrated hexagonal layers, based on the coordination number and bond length of the B-N first neighbor correlation.

Original languageEnglish
Pages (from-to)1119-1125
Number of pages7
JournalJournal of Non-Crystalline Solids
Volume95-96
Issue numberPART 2
DOIs
Publication statusPublished - 1987 Dec 1

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Ceramics and Composites
  • Condensed Matter Physics
  • Materials Chemistry

Fingerprint Dive into the research topics of 'Atomic-scale structure of CVO amorphous Si<sub>3</sub>N<sub>4</sub>-BN composite'. Together they form a unique fingerprint.

Cite this