Atomic-scale depth profiling of composition, chemical structure and electronic band structure of La 2 O 3 /Si(1 0 0) interfacial transition layer

H. Nohira, T. Shiraishi, K. Takahashi, T. Hattori, I. Kashiwagi, C. Ohshima, S. Ohmi, H. Iwai, S. Joumori, K. Nakajima, M. Suzuki, K. Kimura

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    Engineering & Materials Science

    Physics & Astronomy

    Chemical Compounds