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Atomic layer deposition of SiO2 for the performance enhancement of fin field effect transistors
Kazuhiko Endo, Yuki Ishikawa, Takashi Matsukawa, Yongxun Liu, Shin Ichi O'Uchi, Kunihiro Sakamoto, Junichi Tsukada, Hiromi Yamauchi, Meishoku Masahara
Research output: Contribution to journal › Article › peer-review
7
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(Scopus)