Atomic layer deposition of SiO2 for the performance enhancement of fin field effect transistors

Kazuhiko Endo, Yuki Ishikawa, Takashi Matsukawa, Yongxun Liu, Shin Ichi O'Uchi, Kunihiro Sakamoto, Junichi Tsukada, Hiromi Yamauchi, Meishoku Masahara

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7 Citations (Scopus)

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