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Atomic layer deposition of 25-nm-thin sidewall spacer for enhancement of FinFET performance
Kazuhiko Endo, Yuki Ishikawa, Takashi Matsukawa, Yongxum Liu, Shin Ichi O'uchi, Kunihiro Sakamoto, Junichi Tsukada, Hiromi Yamauchi, Meishoku Masahara
Research output: Chapter in Book/Report/Conference proceeding › Conference contribution
2
Citations
(Scopus)