Atomic layer defect-free etching for germanium using HBr neutral beam

Takuya Fujii, Daisuke Ohori, Shuichi Noda, Yosuke Tanimoto, Daisuke Sato, Hideyuki Kurihara, Wataru Mizubayashi, Kazuhiko Endo, Yiming Li, Yao Jen Lee, Takuya Ozaki, Seiji Samukawa

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