Atomic layer-by-layer epitaxy of oxide superconductors by MOCVD

Shuu'ichirou Yamamoto; Atsushi Kawaguchi; Kouji Nagata; Takeo Hattori; Shunri Oda

doi:10.1016/S0169-4332(96)01005-7

Atomic layer-by-layer epitaxy of oxide superconductors by MOCVD

Shuu'ichirou Yamamoto, Atsushi Kawaguchi, Kouji Nagata, Takeo Hattori, Shunri Oda

Research output: Contribution to journal › Article › peer-review

13 Citations (Scopus)

Abstract

We have prepared thin films of c-axis oriented YBa ₂ Cu ₃ O _x (YBCO) with a very smooth surface and roughness of less than a monomolecular layer of YBCO by atomic layer-by-layer metalorganic chemical vapor deposition on SrTiO ₃ (100) and NdGaO ₃ (110) substrates. A YBCO film with a large terrace width of 660 nm has been obtained on a NdGaO ₃ (110) substrate. We have clarified the correlation between boulder formation and dislocations in the substrates by atomic force microscope observation. We have attempted to avoid producing boulder nuclei on dislocations exposed on the substrate surface by changing the usual sequence of source supply, Ba/Cu/Ba/Cu/Y/Cu, for 1 cycle into a new sequence, Ba/Ba/Y/Cu/Cu/Cu, and have successfully prevented the boulders. We also discuss issues of third generation precursors which are used in the liquid phase. We have also investigated hetero epitaxy of Sm ₂ O ₃ ultrathin insulating films on YBCO thin films.

Original language	English
Pages (from-to)	30-37
Number of pages	8
Journal	Applied Surface Science
Volume	112
DOIs	https://doi.org/10.1016/S0169-4332(96)01005-7
Publication status	Published - 1997 Mar
Externally published	Yes

Keywords

Atomic force microscope (AFM)
Liquid precursor
Metalorganic chemical vapor deposition (MOCVD)
Preferential growth
Surface migration
YBa Cu O

ASJC Scopus subject areas

Chemistry(all)
Condensed Matter Physics
Physics and Astronomy(all)
Surfaces and Interfaces
Surfaces, Coatings and Films

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10.1016/S0169-4332(96)01005-7

Cite this

@article{861880056c024680a4da17defc24c4fe,

title = "Atomic layer-by-layer epitaxy of oxide superconductors by MOCVD",

abstract = " We have prepared thin films of c-axis oriented YBa 2 Cu 3 O x (YBCO) with a very smooth surface and roughness of less than a monomolecular layer of YBCO by atomic layer-by-layer metalorganic chemical vapor deposition on SrTiO 3 (100) and NdGaO 3 (110) substrates. A YBCO film with a large terrace width of 660 nm has been obtained on a NdGaO 3 (110) substrate. We have clarified the correlation between boulder formation and dislocations in the substrates by atomic force microscope observation. We have attempted to avoid producing boulder nuclei on dislocations exposed on the substrate surface by changing the usual sequence of source supply, Ba/Cu/Ba/Cu/Y/Cu, for 1 cycle into a new sequence, Ba/Ba/Y/Cu/Cu/Cu, and have successfully prevented the boulders. We also discuss issues of third generation precursors which are used in the liquid phase. We have also investigated hetero epitaxy of Sm 2 O 3 ultrathin insulating films on YBCO thin films. ",

keywords = "Atomic force microscope (AFM), Liquid precursor, Metalorganic chemical vapor deposition (MOCVD), Preferential growth, Surface migration, YBa Cu O",

author = "Shuu'ichirou Yamamoto and Atsushi Kawaguchi and Kouji Nagata and Takeo Hattori and Shunri Oda",

note = "Funding Information: This work was supported in part by a Grant-in-Aid for Scientific Research from the Ministry of Education, Science and Culture, by NEDO under the management of FED, and by the Yazaki Memorial Foundation.",

year = "1997",

month = mar,

doi = "10.1016/S0169-4332(96)01005-7",

language = "English",

volume = "112",

pages = "30--37",

journal = "Applied Surface Science",

issn = "0169-4332",

publisher = "Elsevier",

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TY - JOUR

T1 - Atomic layer-by-layer epitaxy of oxide superconductors by MOCVD

AU - Yamamoto, Shuu'ichirou

AU - Kawaguchi, Atsushi

AU - Nagata, Kouji

AU - Hattori, Takeo

AU - Oda, Shunri

N1 - Funding Information: This work was supported in part by a Grant-in-Aid for Scientific Research from the Ministry of Education, Science and Culture, by NEDO under the management of FED, and by the Yazaki Memorial Foundation.

PY - 1997/3

Y1 - 1997/3

N2 - We have prepared thin films of c-axis oriented YBa 2 Cu 3 O x (YBCO) with a very smooth surface and roughness of less than a monomolecular layer of YBCO by atomic layer-by-layer metalorganic chemical vapor deposition on SrTiO 3 (100) and NdGaO 3 (110) substrates. A YBCO film with a large terrace width of 660 nm has been obtained on a NdGaO 3 (110) substrate. We have clarified the correlation between boulder formation and dislocations in the substrates by atomic force microscope observation. We have attempted to avoid producing boulder nuclei on dislocations exposed on the substrate surface by changing the usual sequence of source supply, Ba/Cu/Ba/Cu/Y/Cu, for 1 cycle into a new sequence, Ba/Ba/Y/Cu/Cu/Cu, and have successfully prevented the boulders. We also discuss issues of third generation precursors which are used in the liquid phase. We have also investigated hetero epitaxy of Sm 2 O 3 ultrathin insulating films on YBCO thin films.

AB - We have prepared thin films of c-axis oriented YBa 2 Cu 3 O x (YBCO) with a very smooth surface and roughness of less than a monomolecular layer of YBCO by atomic layer-by-layer metalorganic chemical vapor deposition on SrTiO 3 (100) and NdGaO 3 (110) substrates. A YBCO film with a large terrace width of 660 nm has been obtained on a NdGaO 3 (110) substrate. We have clarified the correlation between boulder formation and dislocations in the substrates by atomic force microscope observation. We have attempted to avoid producing boulder nuclei on dislocations exposed on the substrate surface by changing the usual sequence of source supply, Ba/Cu/Ba/Cu/Y/Cu, for 1 cycle into a new sequence, Ba/Ba/Y/Cu/Cu/Cu, and have successfully prevented the boulders. We also discuss issues of third generation precursors which are used in the liquid phase. We have also investigated hetero epitaxy of Sm 2 O 3 ultrathin insulating films on YBCO thin films.

KW - Atomic force microscope (AFM)

KW - Liquid precursor

KW - Metalorganic chemical vapor deposition (MOCVD)

KW - Preferential growth

KW - Surface migration

KW - YBa Cu O

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DO - 10.1016/S0169-4332(96)01005-7

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VL - 112

SP - 30

EP - 37

JO - Applied Surface Science

JF - Applied Surface Science

ER -

Atomic layer-by-layer epitaxy of oxide superconductors by MOCVD

Abstract

Keywords

ASJC Scopus subject areas

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