TY - JOUR
T1 - ATOM-PROBE FIELD-ION MICROSCOPY OF A HIGH INTENSITY GALLIUM ION SOURCE.
AU - Culbertson, Robert J.
AU - Robertson, G. H.
AU - Kuk, Y.
AU - Sakurai, T.
PY - 1979/1
Y1 - 1979/1
N2 - The emission characteristics of a liquid-metal ion source have been studied with a magnetic-sector atom-probe field-ion microscope. The emission is classified into low, intermediate, and high intensity emission regimes. In the high intensity emission regime the emission is approximately 99% Ga** plus , but Ga** plus ** plus and molecular gallium ions are also present. The relative intensities of Ga** plus , Ga** plus ** plus , Ga//2** plus , and Ga//3** plus were measured as a function of total current in the high intensity emission regime. Energy distributions of these four species were also measured at various total currents.
AB - The emission characteristics of a liquid-metal ion source have been studied with a magnetic-sector atom-probe field-ion microscope. The emission is classified into low, intermediate, and high intensity emission regimes. In the high intensity emission regime the emission is approximately 99% Ga** plus , but Ga** plus ** plus and molecular gallium ions are also present. The relative intensities of Ga** plus , Ga** plus ** plus , Ga//2** plus , and Ga//3** plus were measured as a function of total current in the high intensity emission regime. Energy distributions of these four species were also measured at various total currents.
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U2 - 10.1116/1.570433
DO - 10.1116/1.570433
M3 - Article
AN - SCOPUS:0018334771
VL - 17
SP - 203
EP - 206
JO - Journal of Vacuum Science and Technology
JF - Journal of Vacuum Science and Technology
SN - 0022-5355
IS - 1
ER -