ATOM-PROBE FIELD-ION MICROSCOPY OF A HIGH INTENSITY GALLIUM ION SOURCE.

Robert J. Culbertson, G. H. Robertson, Y. Kuk, T. Sakurai

    Research output: Contribution to journalArticlepeer-review

    34 Citations (Scopus)

    Abstract

    The emission characteristics of a liquid-metal ion source have been studied with a magnetic-sector atom-probe field-ion microscope. The emission is classified into low, intermediate, and high intensity emission regimes. In the high intensity emission regime the emission is approximately 99% Ga** plus , but Ga** plus ** plus and molecular gallium ions are also present. The relative intensities of Ga** plus , Ga** plus ** plus , Ga//2** plus , and Ga//3** plus were measured as a function of total current in the high intensity emission regime. Energy distributions of these four species were also measured at various total currents.

    Original languageEnglish
    Pages (from-to)203-206
    Number of pages4
    JournalJournal of vacuum science & technology
    Volume17
    Issue number1
    DOIs
    Publication statusPublished - 1979 Jan

    ASJC Scopus subject areas

    • Engineering(all)

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