At-wavelength extreme ultraviolet lithography mask observation using a high-magnification objective with three multilayer mirrors

Mitsunori Toyoda, Kenjiro Yamasoe, Tadashi Hatano, Mihiro Yanagihara, Akifumi Tokimasa, Tetsuo Harada, Takeo Watanabe, Hiroo Kinoshita

    Research output: Contribution to journalArticlepeer-review

    20 Citations (Scopus)

    Abstract

    Motivated by the need for at-wavelength observation of extreme ultraviolet (EUV) lithography masks, we developed a full-field EUV microscope that has a multilayer-mirror objective. This objective is based on an innovative optical design that gives a magnification of over ×1400, enabling us to use a conventional charge-coupled device (CCD) camera as the detector. In addition, when the objective is corrected for off-axis aberrations, it has a large field of view of a few hundred micrometers, permitting rapid inspection of a whole mask. We demonstrate this novel design by presenting at-wavelength images of a mask.

    Original languageEnglish
    Article number112501
    JournalApplied Physics Express
    Volume5
    Issue number11
    DOIs
    Publication statusPublished - 2012 Nov 1

    ASJC Scopus subject areas

    • Engineering(all)
    • Physics and Astronomy(all)

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