Artificial fabrication and characterization of L10-ordered FeNi thin films

K. Takanashi, M. Mizuguchi, T. Kojima, T. Tashiro

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

L10-FeNi, showing uniaxial magnetic anisotropy (Ku) of 1.3×107 erg/cm3 in a bulk sample[1], is promising as a 'rare metal-free' high Ku material. It is known that iron meteorites contain the L10-FeNi phase, what is called 'tetrataenite', which reveals unique magnetic properties different from usual Fe-Ni alloys[2]. However, the artificial fabrication of L10-FeNi is difficult because the order-disorder transformation temperature is low (∼320C), and below this temperature the atomic diffusion is extremely slow. In this study, we have tried to fabricate L10-FeNi thin films with high Ku by two methods: molecular beam epitaxy (MBE) and sputtering.

Original languageEnglish
Title of host publication2015 IEEE International Magnetics Conference, INTERMAG 2015
PublisherInstitute of Electrical and Electronics Engineers Inc.
ISBN (Electronic)9781479973224
DOIs
Publication statusPublished - 2015 Jul 14
Event2015 IEEE International Magnetics Conference, INTERMAG 2015 - Beijing, China
Duration: 2015 May 112015 May 15

Publication series

Name2015 IEEE International Magnetics Conference, INTERMAG 2015

Other

Other2015 IEEE International Magnetics Conference, INTERMAG 2015
CountryChina
CityBeijing
Period15/5/1115/5/15

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering
  • Surfaces, Coatings and Films

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    Takanashi, K., Mizuguchi, M., Kojima, T., & Tashiro, T. (2015). Artificial fabrication and characterization of L10-ordered FeNi thin films. In 2015 IEEE International Magnetics Conference, INTERMAG 2015 [7157055] (2015 IEEE International Magnetics Conference, INTERMAG 2015). Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/INTMAG.2015.7157055