Artificial fabrication and characterization of L10-ordered FeNi thin films

K. Takanashi; M. Mizuguchi; T. Kojima; T. Tashiro

doi:10.1109/INTMAG.2015.7157055

Artificial fabrication and characterization of L1₀-ordered FeNi thin films

K. Takanashi, M. Mizuguchi, T. Kojima, T. Tashiro

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

L1₀-FeNi, showing uniaxial magnetic anisotropy (K_u) of 1.3×10⁷ erg/cm³ in a bulk sample[1], is promising as a 'rare metal-free' high K_u material. It is known that iron meteorites contain the L1₀-FeNi phase, what is called 'tetrataenite', which reveals unique magnetic properties different from usual Fe-Ni alloys[2]. However, the artificial fabrication of L1₀-FeNi is difficult because the order-disorder transformation temperature is low (∼320C), and below this temperature the atomic diffusion is extremely slow. In this study, we have tried to fabricate L1₀-FeNi thin films with high K_u by two methods: molecular beam epitaxy (MBE) and sputtering.

Original language	English
Title of host publication	2015 IEEE International Magnetics Conference, INTERMAG 2015
Publisher	Institute of Electrical and Electronics Engineers Inc.
ISBN (Electronic)	9781479973224
DOIs	https://doi.org/10.1109/INTMAG.2015.7157055
Publication status	Published - 2015 Jul 14
Event	2015 IEEE International Magnetics Conference, INTERMAG 2015 - Beijing, China Duration: 2015 May 11 → 2015 May 15

Publication series

Name	2015 IEEE International Magnetics Conference, INTERMAG 2015

Other

Other	2015 IEEE International Magnetics Conference, INTERMAG 2015
Country	China
City	Beijing
Period	15/5/11 → 15/5/15

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Electrical and Electronic Engineering
Surfaces, Coatings and Films

Access to Document

10.1109/INTMAG.2015.7157055

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Cite this

Takanashi, K., Mizuguchi, M., Kojima, T., & Tashiro, T. (2015). Artificial fabrication and characterization of L1₀-ordered FeNi thin films. In 2015 IEEE International Magnetics Conference, INTERMAG 2015 [7157055] (2015 IEEE International Magnetics Conference, INTERMAG 2015). Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/INTMAG.2015.7157055

Artificial fabrication and characterization of L1₀-ordered FeNi thin films. / Takanashi, K.; Mizuguchi, M.; Kojima, T.; Tashiro, T.

2015 IEEE International Magnetics Conference, INTERMAG 2015. Institute of Electrical and Electronics Engineers Inc., 2015. 7157055 (2015 IEEE International Magnetics Conference, INTERMAG 2015).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Takanashi, K, Mizuguchi, M, Kojima, T & Tashiro, T 2015, Artificial fabrication and characterization of L1₀-ordered FeNi thin films. in 2015 IEEE International Magnetics Conference, INTERMAG 2015., 7157055, 2015 IEEE International Magnetics Conference, INTERMAG 2015, Institute of Electrical and Electronics Engineers Inc., 2015 IEEE International Magnetics Conference, INTERMAG 2015, Beijing, China, 15/5/11. https://doi.org/10.1109/INTMAG.2015.7157055

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abstract = "L10-FeNi, showing uniaxial magnetic anisotropy (Ku) of 1.3×107 erg/cm3 in a bulk sample[1], is promising as a 'rare metal-free' high Ku material. It is known that iron meteorites contain the L10-FeNi phase, what is called 'tetrataenite', which reveals unique magnetic properties different from usual Fe-Ni alloys[2]. However, the artificial fabrication of L10-FeNi is difficult because the order-disorder transformation temperature is low (∼320C), and below this temperature the atomic diffusion is extremely slow. In this study, we have tried to fabricate L10-FeNi thin films with high Ku by two methods: molecular beam epitaxy (MBE) and sputtering.",

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