Argon plasma decomposition of porogen in mesoporous silica films studied by positron annihilation

Chunqing He; Kenji Ito; Toshitaka Oka; Yoshinori Kobayashi; Toshiyuki Ohdaira; Ryoichi Suzuki

doi:10.4028/www.scientific.net/MSF.733.193

Argon plasma decomposition of porogen in mesoporous silica films studied by positron annihilation

Chunqing He, Kenji Ito, Toshitaka Oka, Yoshinori Kobayashi, Toshiyuki Ohdaira, Ryoichi Suzuki

Division of Developmental Research in Education Programs

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

Mesoporous silica films on Si wafers were prepared via a sol-gel process using a triblock copolymer as the structural template. Spin-coated films were dried and subsequently subjected to Ar plasma treatments for decomposing the polymeric porogen. Mesopore formation in the silica film upon Ar plasma treatments was investigated by positron annihilation lifetime spectroscopy. In comparison with calcined silica film, much larger pores, more heterogeneous in size were found in silica film prepared with Ar plasma decomposition of the porogen.

Original language	English
Title of host publication	Positron and Positronium Chemistry X
Publisher	Trans Tech Publications Ltd
Pages	193-196
Number of pages	4
ISBN (Print)	9783037855188
DOIs	https://doi.org/10.4028/www.scientific.net/MSF.733.193
Publication status	Published - 2013
Event	10th International Workshop on Positron and Positronium Chemistry, PPC-10 - Smolenice Castle, Slovakia Duration: 2011 Sept 5 → 2011 Sept 9

Publication series

Name	Materials Science Forum
Volume	733
ISSN (Print)	0255-5476
ISSN (Electronic)	1662-9752

Other

Other	10th International Workshop on Positron and Positronium Chemistry, PPC-10
Country/Territory	Slovakia
City	Smolenice Castle
Period	11/9/5 → 11/9/9

Keywords

Mesoporous
Plasma treatment
Positron annihilation
Silica film

ASJC Scopus subject areas

Materials Science(all)
Condensed Matter Physics
Mechanics of Materials
Mechanical Engineering

Access to Document

10.4028/www.scientific.net/MSF.733.193

Cite this

He, C, Ito, K, Oka, T, Kobayashi, Y, Ohdaira, T & Suzuki, R 2013, Argon plasma decomposition of porogen in mesoporous silica films studied by positron annihilation. in Positron and Positronium Chemistry X. Materials Science Forum, vol. 733, Trans Tech Publications Ltd, pp. 193-196, 10th International Workshop on Positron and Positronium Chemistry, PPC-10, Smolenice Castle, Slovakia, 11/9/5. https://doi.org/10.4028/www.scientific.net/MSF.733.193

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AU - He, Chunqing

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AU - Ohdaira, Toshiyuki

AU - Suzuki, Ryoichi

PY - 2013

Y1 - 2013

N2 - Mesoporous silica films on Si wafers were prepared via a sol-gel process using a triblock copolymer as the structural template. Spin-coated films were dried and subsequently subjected to Ar plasma treatments for decomposing the polymeric porogen. Mesopore formation in the silica film upon Ar plasma treatments was investigated by positron annihilation lifetime spectroscopy. In comparison with calcined silica film, much larger pores, more heterogeneous in size were found in silica film prepared with Ar plasma decomposition of the porogen.

AB - Mesoporous silica films on Si wafers were prepared via a sol-gel process using a triblock copolymer as the structural template. Spin-coated films were dried and subsequently subjected to Ar plasma treatments for decomposing the polymeric porogen. Mesopore formation in the silica film upon Ar plasma treatments was investigated by positron annihilation lifetime spectroscopy. In comparison with calcined silica film, much larger pores, more heterogeneous in size were found in silica film prepared with Ar plasma decomposition of the porogen.

KW - Mesoporous

KW - Plasma treatment

KW - Positron annihilation

KW - Silica film

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Argon plasma decomposition of porogen in mesoporous silica films studied by positron annihilation

Abstract

Publication series

Other

Keywords

ASJC Scopus subject areas

Access to Document

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