Argon plasma decomposition of porogen in mesoporous silica films studied by positron annihilation

Chunqing He, Kenji Ito, Toshitaka Oka, Yoshinori Kobayashi, Toshiyuki Ohdaira, Ryoichi Suzuki

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Mesoporous silica films on Si wafers were prepared via a sol-gel process using a triblock copolymer as the structural template. Spin-coated films were dried and subsequently subjected to Ar plasma treatments for decomposing the polymeric porogen. Mesopore formation in the silica film upon Ar plasma treatments was investigated by positron annihilation lifetime spectroscopy. In comparison with calcined silica film, much larger pores, more heterogeneous in size were found in silica film prepared with Ar plasma decomposition of the porogen.

Original languageEnglish
Title of host publicationPositron and Positronium Chemistry X
PublisherTrans Tech Publications Ltd
Pages193-196
Number of pages4
ISBN (Print)9783037855188
DOIs
Publication statusPublished - 2013 Jan 1
Event10th International Workshop on Positron and Positronium Chemistry, PPC-10 - Smolenice Castle, Slovakia
Duration: 2011 Sep 52011 Sep 9

Publication series

NameMaterials Science Forum
Volume733
ISSN (Print)0255-5476
ISSN (Electronic)1662-9752

Other

Other10th International Workshop on Positron and Positronium Chemistry, PPC-10
CountrySlovakia
CitySmolenice Castle
Period11/9/511/9/9

Keywords

  • Mesoporous
  • Plasma treatment
  • Positron annihilation
  • Silica film

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

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  • Cite this

    He, C., Ito, K., Oka, T., Kobayashi, Y., Ohdaira, T., & Suzuki, R. (2013). Argon plasma decomposition of porogen in mesoporous silica films studied by positron annihilation. In Positron and Positronium Chemistry X (pp. 193-196). (Materials Science Forum; Vol. 733). Trans Tech Publications Ltd. https://doi.org/10.4028/www.scientific.net/MSF.733.193