Applications of polysilanes for a negative-tone resist in ion beam lithography

Yoshinori Matsui, Shu Seki, Satoshi Tsukuda, Takahiro Kozawa, Seiichi Tagawa

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

In this paper, we investigated polysilanes as negative-tone resists for FIB lithography.

Original languageEnglish
Title of host publicationDigest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages106-107
Number of pages2
ISBN (Electronic)4891140402, 9784891140403
DOIs
Publication statusPublished - 2003 Jan 1
Externally publishedYes
EventInternational Microprocesses and Nanotechnology Conference, MNC 2003 - Tokyo, Japan
Duration: 2003 Oct 292003 Oct 31

Publication series

NameDigest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003

Other

OtherInternational Microprocesses and Nanotechnology Conference, MNC 2003
CountryJapan
CityTokyo
Period03/10/2903/10/31

ASJC Scopus subject areas

  • Hardware and Architecture
  • Electrical and Electronic Engineering

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