Applications of polysilanes for a negative-tone resist in ion beam lithography

Yoshinori Matsui; Shu Seki; Satoshi Tsukuda; Takahiro Kozawa; Seiichi Tagawa

doi:10.1109/IMNC.2003.1268598

Applications of polysilanes for a negative-tone resist in ion beam lithography

Yoshinori Matsui, Shu Seki, Satoshi Tsukuda, Takahiro Kozawa, Seiichi Tagawa

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

In this paper, we investigated polysilanes as negative-tone resists for FIB lithography.

Original language	English
Title of host publication	Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003
Publisher	Institute of Electrical and Electronics Engineers Inc.
Pages	106-107
Number of pages	2
ISBN (Electronic)	4891140402, 9784891140403
DOIs	https://doi.org/10.1109/IMNC.2003.1268598
Publication status	Published - 2003
Externally published	Yes
Event	International Microprocesses and Nanotechnology Conference, MNC 2003 - Tokyo, Japan Duration: 2003 Oct 29 → 2003 Oct 31

Publication series

Name	Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003

Other

Other	International Microprocesses and Nanotechnology Conference, MNC 2003
Country/Territory	Japan
City	Tokyo
Period	03/10/29 → 03/10/31

ASJC Scopus subject areas

Hardware and Architecture
Electrical and Electronic Engineering

Access to Document

10.1109/IMNC.2003.1268598

Cite this

Matsui, Y., Seki, S., Tsukuda, S., Kozawa, T., & Tagawa, S. (2003). Applications of polysilanes for a negative-tone resist in ion beam lithography. In Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003 (pp. 106-107). [1268598] (Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003). Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/IMNC.2003.1268598

Applications of polysilanes for a negative-tone resist in ion beam lithography. / Matsui, Yoshinori; Seki, Shu; Tsukuda, Satoshi et al.

Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003. Institute of Electrical and Electronics Engineers Inc., 2003. p. 106-107 1268598 (Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Matsui, Y, Seki, S, Tsukuda, S, Kozawa, T & Tagawa, S 2003, Applications of polysilanes for a negative-tone resist in ion beam lithography. in Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003., 1268598, Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003, Institute of Electrical and Electronics Engineers Inc., pp. 106-107, International Microprocesses and Nanotechnology Conference, MNC 2003, Tokyo, Japan, 03/10/29. https://doi.org/10.1109/IMNC.2003.1268598

Matsui Y, Seki S, Tsukuda S, Kozawa T, Tagawa S. Applications of polysilanes for a negative-tone resist in ion beam lithography. In Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003. Institute of Electrical and Electronics Engineers Inc. 2003. p. 106-107. 1268598. (Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003). doi: 10.1109/IMNC.2003.1268598

Matsui, Yoshinori ; Seki, Shu ; Tsukuda, Satoshi et al. / Applications of polysilanes for a negative-tone resist in ion beam lithography. Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003. Institute of Electrical and Electronics Engineers Inc., 2003. pp. 106-107 (Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003).

@inproceedings{7c84e967246a468c9c911fed5c5d3320,

title = "Applications of polysilanes for a negative-tone resist in ion beam lithography",

abstract = "In this paper, we investigated polysilanes as negative-tone resists for FIB lithography.",

author = "Yoshinori Matsui and Shu Seki and Satoshi Tsukuda and Takahiro Kozawa and Seiichi Tagawa",

note = "Publisher Copyright: {\textcopyright} 2003 Japan Soc. of Applied.; International Microprocesses and Nanotechnology Conference, MNC 2003 ; Conference date: 29-10-2003 Through 31-10-2003",

year = "2003",

doi = "10.1109/IMNC.2003.1268598",

language = "English",

series = "Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003",

publisher = "Institute of Electrical and Electronics Engineers Inc.",

pages = "106--107",

booktitle = "Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003",

}

TY - GEN

T1 - Applications of polysilanes for a negative-tone resist in ion beam lithography

AU - Matsui, Yoshinori

AU - Seki, Shu

AU - Tsukuda, Satoshi

AU - Kozawa, Takahiro

AU - Tagawa, Seiichi

PY - 2003

Y1 - 2003

N2 - In this paper, we investigated polysilanes as negative-tone resists for FIB lithography.

AB - In this paper, we investigated polysilanes as negative-tone resists for FIB lithography.

UR - http://www.scopus.com/inward/record.url?scp=84949233666&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84949233666&partnerID=8YFLogxK

U2 - 10.1109/IMNC.2003.1268598

DO - 10.1109/IMNC.2003.1268598

M3 - Conference contribution

AN - SCOPUS:84949233666

T3 - Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003

SP - 106

EP - 107

BT - Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003

PB - Institute of Electrical and Electronics Engineers Inc.

T2 - International Microprocesses and Nanotechnology Conference, MNC 2003

Y2 - 29 October 2003 through 31 October 2003

ER -

Applications of polysilanes for a negative-tone resist in ion beam lithography

Abstract

Publication series

Other

ASJC Scopus subject areas

Access to Document

Other files and links

Fingerprint

Cite this