Application of rotation magnet sputtering technology to a-IGZO film depositions

Research output: Contribution to journalArticle

3 Citations (Scopus)

Abstract

We developed new magnetron sputtering equipment called rotation magnet sputtering (RMS), where multiple moving plasma loops are exited on the planar target surface, obtaining high target utilization. The moving plasma loops also worked efficiently to homogenize the spatial distribution of a-IGZO film qualities by time-averaged homogenization effect.

Original languageEnglish
Pages (from-to)5-8
Number of pages4
JournalDigest of Technical Papers - SID International Symposium
Volume45
Issue number1
DOIs
Publication statusPublished - 2014 Jun

Keywords

  • InGaZnO
  • TFT
  • rotation magnet sputtering

ASJC Scopus subject areas

  • Engineering(all)

Fingerprint Dive into the research topics of 'Application of rotation magnet sputtering technology to a-IGZO film depositions'. Together they form a unique fingerprint.

  • Cite this