Application of pulsed voltage to d.c. glow discharge plasma for controlling the sputtering rate in glow discharge optical emission spectrometry

Kazuaki Wagatsuma

Research output: Contribution to journalArticlepeer-review

10 Citations (Scopus)

Abstract

The application of a pulsed voltage to a Grimm-style glow discharge lamp was investigated to control the sputtering rate in d.c. glow discharge optical emission spectrometry. This purpose is to reduce the sampling depth so that thin film-like samples can be measured with a better spatial resolution and a better analytical precision. While the sputtering rate decreases by using a pulsed voltage due to the reduction in the effective discharge power, the emission signals from the glow discharge plasma are modulated by a cyclic variation of the discharge voltage so that only the desired signals can be detected without any noises with a lock-in amplifier. Whereas the sputtering rate could be more than 50 % reduced when the duty ratio of the pulsed voltage was down to 20% compared to the rate in the corresponding continuous discharge, the emission intensities could be estimated with much better signal-to-noise ratios.

Original languageEnglish
Pages (from-to)108-114
Number of pages7
JournalIsij International
Volume44
Issue number1
DOIs
Publication statusPublished - 2004
Externally publishedYes

Keywords

  • Chromium
  • Glow discharge optical emission spectrometry
  • Light modulation
  • Pulsed voltage
  • Sputtering rate
  • Steel

ASJC Scopus subject areas

  • Mechanics of Materials
  • Mechanical Engineering
  • Metals and Alloys
  • Materials Chemistry

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