Application of nanocrystalline fe(or co-fe)-hf-o magnetic films with high electrical resistivity to micro dc-dc converters

Toshiro Sato, Eiichi Komai, Kiyohito Yamasawa, Takashi Hatanai, Akihiro Makino

Research output: Contribution to journalArticlepeer-review

23 Citations (Scopus)

Abstract

High resistivity magnetic films, such as reactive sputtered Fe-Hf-O and Co-Fe-Hf-O, were applied to multilayered micro reactors for high frequency operation dc-dc converters. For a comparison, an amorphous Co-Ta-Hf film with good soft magnetic properties was also investigated. The micro reactor had the highest quality factor(the lowest loss) when using Co-Fe-Hf-O film with the highest resistivity. In 5MHz operation of dc-dc converters using these micro reactors, the highest conversion efficiency was obtained when using Co-Fe-Hf-O film.

Original languageEnglish
Pages (from-to)3310-3312
Number of pages3
JournalIEEE Transactions on Magnetics
Volume33
Issue number5 PART 1
DOIs
Publication statusPublished - 1997
Externally publishedYes

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering

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