Application of multistep formation during molecular beam epitaxy for fabricating novel nanomechanical structures

H. Yamaguchi, Y. Hirayama

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

The technique of controlling the surface step distributions during molecular beam epitaxy has been widely used in the fabrication of semiconductor low-dimensional structures. In particular, the multistep structures formed via step bunching during growth are frequently applied for the growth of semiconductor quantum wires. This is a clean fabrication technique for semiconductor nanostructures that does not rely on lithographic processes, which often degrade crystalline quality. Here, we demonstrate, for the first time, the application of this "bottom-up" technique to the fabrication of semiconductor nanomechanical structures, which have the potential to bring about a revolution in the application of nanoscale fine-structure devices, such as high-resolution actuators and sensors, high-frequency signal processing components, and medical diagnostic devices.

Original languageEnglish
Title of host publicationMBE 2002 - 2002 12th International Conference on Molecular Beam Epitaxy
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages319-320
Number of pages2
ISBN (Electronic)0780375815, 9780780375819
DOIs
Publication statusPublished - 2002 Jan 1
Externally publishedYes
Event12th International Conference on Molecular Beam Epitaxy, MBE 2002 - San Francisco, United States
Duration: 2002 Sep 152002 Sep 20

Publication series

NameMBE 2002 - 2002 12th International Conference on Molecular Beam Epitaxy

Other

Other12th International Conference on Molecular Beam Epitaxy, MBE 2002
CountryUnited States
CitySan Francisco
Period02/9/1502/9/20

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials
  • Materials Chemistry

Fingerprint Dive into the research topics of 'Application of multistep formation during molecular beam epitaxy for fabricating novel nanomechanical structures'. Together they form a unique fingerprint.

Cite this