Application of focused ion beam method to polymer materials

Takava Uno, Tadao Nishioka, Yukihiro Nishkawa, Ken Ichi Nihara, Hiroshi Jinnai

Research output: Contribution to conferencePaperpeer-review

Abstract

In our previous study, we found that the polymer(s) can be milled and fabricated by a Focused Ion Beam (FIB) method, which would open new possibility for nano-fabrication of polymeric materials in the near future. Thus, a fundamental set of information, e.g. etching rate and degree of penetration of gallium ion in materials during milling ("Ga penetration"), will be required for polymeric materials. In the present study, the two fundamental parameters above were actually measured for (stained) polymeric samples. It turned out that the etching rate for the polymers were similar to that for Si substrate and the Ga ions were penetrated down to ca. 15 nm beneath the milled surface of the polymeric samples.

Original languageEnglish
Number of pages1
Publication statusPublished - 2005 Dec 1
Externally publishedYes
Event54th SPSJ Annual Meeting 2005 - Yokohama, Japan
Duration: 2005 May 252005 May 27

Other

Other54th SPSJ Annual Meeting 2005
CountryJapan
CityYokohama
Period05/5/2505/5/27

Keywords

  • Etching rate
  • Focused ion beam
  • Transmission electron microscopy

ASJC Scopus subject areas

  • Engineering(all)

Fingerprint Dive into the research topics of 'Application of focused ion beam method to polymer materials'. Together they form a unique fingerprint.

Cite this