Antireflective subwavelength structures on crystalline Si fabricated using directly formed anodic porous alumina masks

Hitoshi Sai, Homare Fujii, Koji Arafune, Yoshio Ohshita, Masafumi Yamaguchi, Yoshiaki Kanamori, Hiroo Yugami

Research output: Contribution to journalArticlepeer-review

136 Citations (Scopus)

Abstract

A simple fabrication technique for subwavelength structured (SWS) surfaces by means of anodic porous alumina masks directly formed on Si substrates was proposed and demonstrated. By this technique, SWS surfaces were fabricated on polished single-crystalline Si and chemically etched as-cut multicrystalline Si wafers. Smoothly tapered SWS surfaces with a periodicity of 100 nm and a height of 300-400 nm were obtained. A low reflectivity below 1% was observed from 300 to 1000 nm for both of the wafers, in agreement with numerical simulation. After thermal annealing at 800 °C, the reflectivity of the SWS surface increased to 3%.

Original languageEnglish
Article number201116
JournalApplied Physics Letters
Volume88
Issue number20
DOIs
Publication statusPublished - 2006 May 15

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

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