Antireflective subwavelength gratings on the end faces of optical fibers fabricated by UV nanoimprint lithography

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Antireflective subwavelength gratings (SWGs) with binary cross-sectional shapes were fabricated on the end faces of optical fibers by using UV nanoimprint lithography. A dedicated UV nanoimprinting machine to press the tip of an optical fiber to a mold was developed. The SWGs with the periods of 700 nm were fabricated at the tips of optical fibers. Their optical characteristics were measured.

Original languageEnglish
Title of host publicationProceedings - OMN2011
Subtitle of host publication16th International Conference on Optical MEMS and Nanophotonics
Pages65-66
Number of pages2
DOIs
Publication statusPublished - 2011 Dec 12
Event16th International Conference on Optical MEMS and Nanophotonics, OMN2011 - Istanbul, Turkey
Duration: 2011 Aug 82011 Aug 11

Publication series

NameInternational Conference on Optical MEMS and Nanophotonics
ISSN (Print)2160-5033
ISSN (Electronic)2160-5041

Other

Other16th International Conference on Optical MEMS and Nanophotonics, OMN2011
Country/TerritoryTurkey
CityIstanbul
Period11/8/811/8/11

Keywords

  • Subwavelength gratings
  • nanoimprint lithography
  • optical communications system
  • optical fibers

ASJC Scopus subject areas

  • Hardware and Architecture
  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials

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