Antireflection subwavelength gratings on optical fiber tips fabricated by a dedicated UV nano imprint lithography system

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Citation (Scopus)

Abstract

Antireflection (AR) layers at the tips of optical fibers are indispensable in order to reduce propagation loss and optical noise. Conventional thin-film AR layers have problems about cost due to vacuum apparatus usage in the fabrication and requirement of many thin-film layers to obtain excellent AR characteristics. Thus, easy AR coating methods are needed to reduce Fresnel reflection. AR structures consisting of subwavelength gratings (SWGs), which have periodic structures with the periods smaller than operating wavelengths, have been extensively investigated. Desired refractive index to realize the ideal AR condition can be obtained by SWGs. Nano imprint lithography (NIL) is known as the low cost fabrication technology of SWGs. However, it is difficult to carry out an NIL process on the tips of flexible and long optical fibers. In this study, we developed a dedicated UV-NIL system for optical fiber end-faces. An SWG with a period of 700 nm, a width of 560 nm, and a height of 250 nm was successfully fabricated at the tip of a single-mode optical fiber for optical communications system. We evaluated that reflectance decreased by using the SWG over measured spectral range. For example, reflectance decreased to 0.2% at a wavelength of 1550 nm.

Original languageEnglish
Title of host publicationHigh Contrast Metastructures IV
EditorsWeimin Zhou, Fumio Koyama, Connie J. Chang-Hasnain, David Fattal
PublisherSPIE
ISBN (Electronic)9781628414622
DOIs
Publication statusPublished - 2015 Jan 1
EventHigh Contrast Metastructures IV - San Francisco, United States
Duration: 2015 Feb 112015 Feb 12

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume9372
ISSN (Print)0277-786X
ISSN (Electronic)1996-756X

Other

OtherHigh Contrast Metastructures IV
CountryUnited States
CitySan Francisco
Period15/2/1115/2/12

Keywords

  • Antireflection
  • nano imprint lithography
  • optical communications system
  • optical fibers
  • subwavelength gratings

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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