Antireflection sub-wavelength gratings fabricated by spin-coating replication

Y. Kanamori, E. Roy, Y. Chen

Research output: Contribution to journalConference articlepeer-review

101 Citations (Scopus)

Abstract

We fabricated an antireflection subwavelength grating (SWG) on a polymethyl methacrylate (PMMA) by a spin-coating replication technique. Silicon molds of a two-dimensional tapered grating of 200 nm period and 90 nm deep have been obtained using electron beam lithography and reactive ion etching. Replication has been done by direct spin-coating a 9.35 μm thick PMMA on the mold, followed by an appropriate mounting on a glass substrate. The transmittance in the wavelength region ranging from 500 to 800 nm was measured and compared with the calculation results on the basis of rigorous coupled-wave analysis. At these wavelengths, the transmittance of the SWG was increased in comparison with that of the flat PMMA sheet, in good agreement with the theoretical calculations.

Original languageEnglish
Pages (from-to)287-293
Number of pages7
JournalMicroelectronic Engineering
Volume78-79
Issue number1-4
DOIs
Publication statusPublished - 2005 Mar
EventProceedings of the 30th International Conference on Micro- and Nano-Engineering -
Duration: 2004 Sep 192004 Sep 22

Keywords

  • Antireflection
  • Mold
  • Nanoimprint lithography
  • Polymethyl methacrylate
  • Replication
  • Rigorous coupled-wave analysis
  • Subwavelength gratings

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Surfaces, Coatings and Films
  • Electrical and Electronic Engineering

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