Abstract
We design subwavelength gratings (SWGs) in 1.55 μm wavelength range used for optical communication devices or solar cells. Also, we propose a novel fabrication technique of SWGs using self-organized nanoparticles, for the large-area and low-cost fabrication. In the fabrication, SiO2 particles with the diameters of 170 nm are spin-coated on a silicon substrate. Then, a 170-nm-period SiO2 particle pattern is formed on the substrate. Using the SiO2 particles as a mask, the silicon substrate is etched by a dry etching machine. A 170-nm-period SWG with tapered profile is fabricated. The SWG height is approximately 820 nm. Reflectivity of the SWG is decreased to be -18.7 dB (1.3%) from -3.39 dB (45.8%) of a Si mirror surface at a wavelength of 1550 nm. Calculated reflectivity of the SWG at a wavelength of 1550 nm is -18.3 dB (1.5%), which almost agrees with the measured value.
Original language | English |
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Pages (from-to) | 92-96 |
Number of pages | 5 |
Journal | IEEJ Transactions on Sensors and Micromachines |
Volume | 130 |
Issue number | 3 |
DOIs | |
Publication status | Published - 2010 Apr 22 |
Keywords
- Nanoparticles
- Nanostructure array
- Near-infrared wavelengths
- Self-organization
- Subwavelength gratings
ASJC Scopus subject areas
- Electrical and Electronic Engineering
- Mechanical Engineering