Antirefiection subwavelength gratings at near-infrared wavelengths fabricated by self-organized nanoparticles

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We design subwavelength gratings (SWGs) in 1.55 μm wavelength range used for optical communication devices or solar cells. Also, we propose a novel fabrication technique of SWGs using self-organized nanoparticles, for the large-area and low-cost fabrication. In the fabrication, SiO2 particles with the diameters of 170 nm are spin-coated on a silicon substrate. Then, a 170-nm-period SiO2 particle pattern is formed on the substrate. Using the SiO2 particles as a mask, the silicon substrate is etched by a dry etching machine. A 170-nm-period SWG with tapered profile is fabricated. The SWG height is approximately 820 nm. Reflectivity of the SWG is decreased to be -18.7 dB (1.3%) from -3.39 dB (45.8%) of a Si mirror surface at a wavelength of 1550 nm. Calculated reflectivity of the SWG at a wavelength of 1550 nm is -18.3 dB (1.5%), which almost agrees with the measured value.

Original languageEnglish
Pages (from-to)92-96
Number of pages5
JournalIEEJ Transactions on Sensors and Micromachines
Issue number3
Publication statusPublished - 2010


  • Nanoparticles
  • Nanostructure array
  • Near-infrared wavelengths
  • Self-organization
  • Subwavelength gratings

ASJC Scopus subject areas

  • Mechanical Engineering
  • Electrical and Electronic Engineering


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